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I have downloaded both, but I prefer to use PowerISO for a reason. not work, in both 64-bit and 32-bit versions. I can’t even start the.rar file.1. Field of the Invention
The present invention relates to a method for determining an optimum mask pattern to create a semiconductor device with a fine structure.
2. Description of the Related Art
The fine structures of a semiconductor device have been increasing in the recent trend of increase in integration density, and reduction of design rule. Design rules below 20 nm are desired for achieving ultra-high integration in the semiconductor device having a micro-structure.
In general, an exposure technique using a mask includes those methods which use a positive type pattern and those methods which use a negative type pattern. The positive type method can use a photoresist material having a sensitivity of a positive function, and can form a fine mask pattern having a line width less than a resolution. On the contrary, the negative type method cannot be formed a fine pattern having a line width less than the resolution, when a photoresist material having a sensitivity of a negative function is used. In some cases, it is necessary to use a negative type photoresist material in the design rule of below 20 nm.
In a mask pattern in which a pattern of the negative type photoresist material is formed on a substrate which is made of a positive type material, the pattern is shrunk, due to the influence of the difference in the etching characteristic between the substrate and the photoresist material, or due to the difference in the coefficient of thermal expansion between the substrate and the photoresist material. That is, the change of pattern size in the photolithography process causes a failure, such as, an uneven size of a line pattern, or in the worst case, a disconnection in the pattern.
As a method of determining a mask pattern which creates a fine structure, there has been a method of determining a mask pattern which creates a fine structure from a phase shift mask, which has been used for an exposure technique of far ultraviolet ray or deep ultraviolet ray. Further, as a method of determining a mask pattern which creates a fine structure, there has been an exposure simulation or the like. When the method of determining a
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